Synthesis and Simulation of Hafnium Oxide based Nanomaterials

Abstract

Hafnium oxide (HfO2) has a wide range of applications including optical coatings, DRAM capacitors, and solar cell devices due to high melting point and wide energy bandgap (5.3- 5.7) eV. In this project, HfO2 based nanomaterials were synthesized by using a hydrothermal method. The synthesized HfO2 nanomaterials were characterized by using several techniques including X-rays diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) analysis. X-ray diffraction (XRD) analysis was used to study the structure of Hafnium Oxide whereas FTIR analysis was used to study the functional groups in HfO2 Nanomaterials. ATLAS Silvaco was used to simulate the tunneling Oxide Passivated Contact (TOPCON) solar cell device results for passivation layers of SiO2 and HfO2. Recently, HfO2 is proposed as a passivation material for solar cell applications